Dual Pyrometer Measurement System

Advanced Thermal Monitoring for Process Consistency

SSS Co’s Dual Pyrometer System enables simultaneous measurement of both wafer and dome temperatures during thermal processing. With real-time correction algorithms and integrated software, the system ensures more consistent power delivery, improved control, and better insight into process behavior.

Pyrometer

What the System Does

  • Measures wafer and dome temperatures in real-time
  • Corrects wafer temperature readings based on dome temperature fluctuations
  • Correction coefficient dynamically calculated using EPICREW software with user-defined parameters
  • Functions under top pyrometer control for process-representative conditions

Benefits of Dual Pyrometer Integration

  • Stabilized input power across process cycles, even during ramp-up or cooldown
  • Improved temperature accuracy during multi-deposition (multi-depo) operations
  • Reduced growth rate variation between initial and subsequent runs
  • Better correlation between dome temperature and true wafer conditions
  • Enables thermal tuning and control to enhance repeatability and yield

Why Choose SSS Co

  • Proven expertise in process instrumentation and semiconductor metrology
  • Integration support for legacy and advanced process tools
  • Trusted by fabs worldwide for precision, data-driven process control